Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 5, 1999, Pages 2058-2060

  Schriever, G ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22844456308     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590872     Document Type: Article

References (2)

1. T. E. Jewell, J. M. Rodgers, and K. P. Thompson, J. Vac. Sci. Technol. B 8, 1519 (1990).
2. N. M. Ceglio, A. M. Hawryluk, and G. E. Sommargren, Appl. Opt. 32, 7050 (1993).