Directed nanostructural evolution in Ti 0.8Ce 0.2N layers grown as a function of low-energy, high-flux ion irradiation

Applied Physics Letters

Volumn 84, Issue 15, 2004, Pages 2796-2798

  Lee, T Y ^a   Kodambaka, S ^a   Wen, J G ^a   Twesten, R D ^a   Greene, J E ^a   Petrov, I ^a  

^a United States of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY (AFM); DEPOSITION FLUX; ION IRRADIATION; RENUCLEATION PROCESSES;

ABRASION; ALLOYING; CRYSTAL GROWTH; DENSIFICATION; DEPOSITION; DIFFUSION; FILM GROWTH; GROWTH KINETICS; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NUCLEATION; SURFACE ROUGHNESS; WEAR RESISTANCE;

TITANIUM ALLOYS;

EID: 2342612929     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1699468     Document Type: Article

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