Temperature scanning small angle x-ray scattering measurements of structural relaxation in type-III vitreous silica

Journal of Applied Physics

Volumn 102, Issue 8, 2007, Pages

  Bruning R ^a   Levelut, C ^b   Le Parc, R ^b   Faivre, A ^c   Semple, L ^a   Vallee, M ^a   Simon, J P ^d   Hazemann, J L ^e  

^a MOUNT ALLISON UNIVERSITY   (Canada)

^b UNIV MONTPELLIER   (France)

^c UNIVERSITÉ MONTPELLIER 2   (France)

^d UNIV GRENOBLE ALPES   (France)

^e CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; RAPID THERMAL ANNEALING; STRUCTURAL RELAXATION; VISCOSITY MEASUREMENT; X RAY SCATTERING;

ADAM-GIBBS-FULCHER EQUATION; GLASS KINETICS; HYDROXYL CONTENT; RELAXATION RATES;

FUSED SILICA;

EID: 35649003064     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2799940     Document Type: Article

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