Fictive temperature dependence of density fluctuation in SiO2 glass

Journal of Applied Physics

Volumn 94, Issue 8, 2003, Pages 4824-4827

  Watanabe, T ^a   Saito, K ^a   Ikushima, A J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PHONONS; RELAXATION PROCESSES; THERMODYNAMICS; X RAY SCATTERING;

DENSITY FLUCTUATIONS;

FUSED SILICA;

EID: 0242380208     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1608477     Document Type: Article

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