EUV mask infrastructure challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Wurm, Stefan ^a   Seidel, Phil ^a   Van Peski, Chris ^a   He, Long ^a   Han, Hakseung ^a   Kearney, Pat ^a   Cho, Wonil ^a  

^a SEMATECH   (United States)

Author keywords

EUV; EUV mask costs; EUV mask flatness; EUV masks; EUV reticle handling; Lithography

Indexed keywords

DEFECTS; EXTREME ULTRAVIOLET LITHOGRAPHY; INSPECTION; POLYSTYRENES; SUBSTRATES;

EUV MASK COSTS; EUV MASK FLATNESS; EUV MASKS; EUV RETICLE HANDLING;

MASKS;

EID: 35648974132     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.737154     Document Type: Conference Paper

References (20)

1. International Extreme Ultra-Violet Lithography (EUVL) Symposia, 2002-2006. The symposium materials can be found at http://www.sematech.org/ meetings/archives.htm.
2. P. Kearney et al., Defect Mitigation and Reduction in EUVL Mask Blanks, in ref [1] (2006).
3. K. Orvek et al., Concept Demonstration of Integrated Particle Defect Control of EUVL Masks, in ref [1] (2005).
4. SEMATECH EUV Mask Technology & Standards Workshop, Barcelona/Spain, 19 Oct. 2006. The workshop proceedings can be found at http://www.sematech. org/meetings/archives.htm.
5. SEMI P37-1102, Specification for Extreme Ultraviolet Lithography Mask Substrates, Semiconductor Equipment and Materials International, San Jose, CA (2002).
6. K. Kemp and S. Wurm, C. R. Physique 7, 875 (2006).
7. E.M. Gullikson et al., Proc. SPIE 5374, 791 (2004).
8. K.A. Goldberg et al., J. Vac. Sci. Technol. B 24, 2824 (2006).
9. U. Kleineberg et al., Proc. SPIE 6151, 615120 (2006).
10. K. Orvek et al., Concept Demonstration of Integrated Particle Defect Control of EUVL Masks, in ref [1] (2005).
11. SEMATECH EUVL Reticle Handling Work Shop, San Jose/CA, 28 Feb. 2005. The workshop proceedings can be found at http://www.sematech.org/meetings/ archives.htm.
12. L. He et. al., Status and Path to Particle-Free EUV Reticle Protection and Handling, in ref [1] (2006).
13. D. Halbmaier et al., EUVL mask carrier system, in ref [1] (2006).
14. K. Ota et al., EUV Reticle Carrier: Joint Proposal and Current Status of Canon and Nikon, in ref [1] (2006).
15. B. Blum in ref [11] (2005).
16. International Technology Roadmap for Semiconductors, http://public. itrs.net.
17. T. Sugiyama et al, Current status of EUVL mask blank development in Asahi Glass Company, in ref [1] (2006).
18. R. Groeneveld, J. Zimmerman, and U. Mickan in ref [4].
19. L.C. Litt, S. Hector, and P. Seidel, Future Fab Intl. 15, 82 (2003).
20. S. Abe et al., Hitachi Review 55 (2006).