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Journal of Colloid and Interface Science

Volumn 316, Issue 2, 2007, Pages 547-552

Metal patterning on silicon surface by site-selective electroless deposition through colloidal crystal templating

(3) Asoh, Hidetaka a Sakamoto, Seiji a Ono, Sachiko a

a KOGAKUIN UNIVERSITY (Japan)

Author keywords

Colloidal crystal templating; Electroless plating; Hydrophobic treatment; Metal pattern

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; ELECTROLESS PLATING; MICROSTRUCTURE; MONOLAYERS; SUBSTRATES;

COLLOIDAL CRYSTAL TEMPLATING; COLLOIDAL SPHERES; HYDROPHOBIC TREATMENT; METAL PATTERN;

SILICON;

COPPER; METAL; NANOCOATING; NANOMATERIAL; NANOPARTICLE; SILICON;

ARTICLE; CHEMICAL STRUCTURE; COLLOID; CRYSTALLIZATION; ELECTROPLATING INDUSTRY; HYDROPHOBICITY; MATERIAL COATING; PARTICLE SIZE; PERIODICITY; PRIORITY JOURNAL; SURFACE PROPERTY;

COLLOIDS; COPPER; CRYSTALLIZATION; PARTICLE SIZE; SILICON; SURFACE PROPERTIES;

EID: 35648952199 PISSN: 00219797 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcis.2007.09.001 Document Type: Article

Times cited : (32)

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