-
1
-
-
35349028490
-
MMRC, University of Tokyo, Tokyo, Japan
-
Paper 64
-
K. Ogawa, MMRC, University of Tokyo, Tokyo, Japan, Paper 64, 2006.
-
(2006)
-
-
Ogawa, K.1
-
2
-
-
31644445598
-
High-power 660-nm laser diodes for recordable dual layer DVDs
-
Sep
-
K. Shibata, Y. Yoshida, M. Sasaki, K. Ono, J.-I. Horie, T. Yagi, and T. Nishimura, "High-power 660-nm laser diodes for recordable dual layer DVDs," IEEE J. Sel. Topics Quantum Electron., vol. 11, no. 5, pp. 1193-1196, Sep. 2005.
-
(2005)
IEEE J. Sel. Topics Quantum Electron
, vol.11
, Issue.5
, pp. 1193-1196
-
-
Shibata, K.1
Yoshida, Y.2
Sasaki, M.3
Ono, K.4
Horie, J.-I.5
Yagi, T.6
Nishimura, T.7
-
3
-
-
20544470162
-
Kink and power saturation of 660-nm AlGaInP laser diodes
-
Jun
-
Y. Yoshida, M. Sasaki, K. Shibata, Z. Kawazu, K. Ono, H. Nishiguchi, T. Yagi, and T. Nishimura, "Kink and power saturation of 660-nm AlGaInP laser diodes," IEEE J. Quantum Electron., vol. 41, no. 6, pp. 828-832, Jun. 2005.
-
(2005)
IEEE J. Quantum Electron
, vol.41
, Issue.6
, pp. 828-832
-
-
Yoshida, Y.1
Sasaki, M.2
Shibata, K.3
Kawazu, Z.4
Ono, K.5
Nishiguchi, H.6
Yagi, T.7
Nishimura, T.8
-
4
-
-
0029394358
-
-
Y. Nagai, T. Shiba, Y. Kunitsugu, M. Miyashita, S. Karakida, H. Watanabe, A. Shima, K. Nagahama, M. Otsubo, K. Ikeda, and W. Susaki, Large-area wafer processing for 0.78-μm AlGaAs laser diodes, IEEE Photon. Technol. Lett., 7, no. 10, pp. 110.1-1103, Oct. 1995.
-
Y. Nagai, T. Shiba, Y. Kunitsugu, M. Miyashita, S. Karakida, H. Watanabe, A. Shima, K. Nagahama, M. Otsubo, K. Ikeda, and W. Susaki, "Large-area wafer processing for 0.78-μm AlGaAs laser diodes," IEEE Photon. Technol. Lett., vol. 7, no. 10, pp. 110.1-1103, Oct. 1995.
-
-
-
-
5
-
-
0029324757
-
Uniform and high-power characteristics of AlGaInP visible laser diodes and their four-element arrays fabricated on a three-inch φ wafer
-
Jun
-
A. Shima, M. Kato, Y. Nagai, T. Motoda, T. Nishimura, E. Omura, and M. Otsubo, "Uniform and high-power characteristics of AlGaInP visible laser diodes and their four-element arrays fabricated on a three-inch φ wafer," IEEE J. Sel. Topics Quantum Electron., vol. 1, no. 2, pp. 734-740, Jun. 1995.
-
(1995)
IEEE J. Sel. Topics Quantum Electron
, vol.1
, Issue.2
, pp. 734-740
-
-
Shima, A.1
Kato, M.2
Nagai, Y.3
Motoda, T.4
Nishimura, T.5
Omura, E.6
Otsubo, M.7
-
6
-
-
3142526626
-
High-power 200 mW 660 nm AlGaInP laser diodes with low operating current
-
Apr
-
R. Hiroyama, D. Inoue, S. Kameyama, A. Tajiri, M. Shono, M. Sawada, and A. Ibaraki, "High-power 200 mW 660 nm AlGaInP laser diodes with low operating current," Jpn. J. Appl. Phys., vol. 43, no. 4B, pp. 1951-1955, Apr. 2004.
-
(2004)
Jpn. J. Appl. Phys
, vol.43
, Issue.4 B
, pp. 1951-1955
-
-
Hiroyama, R.1
Inoue, D.2
Kameyama, S.3
Tajiri, A.4
Shono, M.5
Sawada, M.6
Ibaraki, A.7
-
7
-
-
23844459589
-
High-power 660-nm GaInP-AlGaInP laser diodes with low vertical beam divergence angles
-
Jul
-
B. Ma, S. Cho, C. Lee, Y. Kim, and Y. Park, "High-power 660-nm GaInP-AlGaInP laser diodes with low vertical beam divergence angles," IEEE Photon. Technol. Lett., vol. 17, no. 7, pp. 1375-1377, Jul. 2005.
-
(2005)
IEEE Photon. Technol. Lett
, vol.17
, Issue.7
, pp. 1375-1377
-
-
Ma, B.1
Cho, S.2
Lee, C.3
Kim, Y.4
Park, Y.5
-
8
-
-
10244257531
-
High-power and high-temperature operation of Mg-doped AlGaInP-based red laser diodes
-
Dec
-
T. Onishi, K. Inoue, K. Onozawa, T. Takayama, and M. Yuri, "High-power and high-temperature operation of Mg-doped AlGaInP-based red laser diodes," IEEE J. Quantum Electron., vol. 40, no. 12, pp. 1634-1638, Dec. 2004.
-
(2004)
IEEE J. Quantum Electron
, vol.40
, Issue.12
, pp. 1634-1638
-
-
Onishi, T.1
Inoue, K.2
Onozawa, K.3
Takayama, T.4
Yuri, M.5
-
9
-
-
0024104443
-
The control and modeling of doping profiles and transients in MOVPE growth
-
T. F. Kuech, P.-J. Wang, M. A. Tischler, R. Potemski, G. J. Scilla, and F. Cardone, "The control and modeling of doping profiles and transients in MOVPE growth," J. Cryst. Growth, vol. 93, pp. 624-630, 1988.
-
(1988)
J. Cryst. Growth
, vol.93
, pp. 624-630
-
-
Kuech, T.F.1
Wang, P.-J.2
Tischler, M.A.3
Potemski, R.4
Scilla, G.J.5
Cardone, F.6
-
10
-
-
0026868489
-
Anomalous Mg incorporation behavior in InGaAlP grown by metalorganic chemical vapor deposition
-
May
-
Y. Nishikawa, H. Sugawara, and Y. Kokubun, "Anomalous Mg incorporation behavior in InGaAlP grown by metalorganic chemical vapor deposition," J. Cryst. Growth, vol. 119, pp. 292-296, May 1992.
-
(1992)
J. Cryst. Growth
, vol.119
, pp. 292-296
-
-
Nishikawa, Y.1
Sugawara, H.2
Kokubun, Y.3
-
11
-
-
84887485545
-
Mass-production of high-voltage GaAs and GaN devices
-
Vancouver, BC, Canada, Apr, paper 12D
-
E. Mitani, H. Haematsu, S. Yokogawa, J. Nikaido, and Y. Tateno, "Mass-production of high-voltage GaAs and GaN devices," in Proc Dig. Compound Semicond. Manuf. Technol. Conf., Vancouver, BC, Canada, Apr. 2006, pp. 183-186, paper 12D
-
(2006)
Proc Dig. Compound Semicond. Manuf. Technol. Conf
, pp. 183-186
-
-
Mitani, E.1
Haematsu, H.2
Yokogawa, S.3
Nikaido, J.4
Tateno, Y.5
|