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Volumn , Issue , 2007, Pages 1436-1441

Joule heating effect on the electromigration lifetimes and failure mechanisms of Sn-3.5Ag solder bump

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DAMAGE DETECTION; ELECTROMIGRATION; FAILURE ANALYSIS; JOULE HEATING; SCANNING ELECTRON MICROSCOPY; SOLDERING;

EID: 35348874185     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2007.373984     Document Type: Conference Paper
Times cited : (19)

References (12)
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  • 2
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  • 3
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    • Electromigration failure mechanisms for SnAg3.5 solder bumps on Ti/Cr-Cu/Cu and Ni(P)/Au metallization pads
    • 15 October, pp, 2004
    • T. L. Shao et al., "Electromigration failure mechanisms for SnAg3.5 solder bumps on Ti/Cr-Cu/Cu and Ni(P)/Au metallization pads" J. Appl. Phys. Vol. 96, No. 8, 15 October, pp. 4518-4524(2004)
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    • Shao, T.L.1
  • 4
    • 30744460875 scopus 로고    scopus 로고
    • S. H. chiu et al., Infrared microscopy of hot spots induced by Joule heating in flip-chip SnAg solder joints under accelerated electromigration, Appl. Phys. Lett, 88, 022110(2006)
    • S. H. chiu et al., "Infrared microscopy of hot spots induced by Joule heating in flip-chip SnAg solder joints under accelerated electromigration", Appl. Phys. Lett, 88, 022110(2006)
  • 5
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    • In situ observation of the void formation-and-rpopagation mechanism in solder joints under current- stressing
    • Y.H. Lin et al., "In situ observation of the void formation-and-rpopagation mechanism in solder joints under current- stressing", Acta Materialia, 53, pp. 2029-2035(2005)
    • (2005) Acta Materialia , vol.53 , pp. 2029-2035
    • Lin, Y.H.1
  • 6
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    • Black, J. R. "electromigration-A Brief Survey and Some Recent Results" IEEE trans. Electron Devices, Vol, ED-16(4), No. 4, 338(1969)
    • (1969) IEEE trans. Electron Devices , vol.16 ED , Issue.4 , pp. 338
    • Black, J.R.1
  • 7
    • 0242721171 scopus 로고    scopus 로고
    • Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-flim under-bump-metallization
    • 1 November, pp, 2003
    • W. J. Choi et al., "Mean-time-to-failure study of flip chip solder joints on Cu/Ni(V)/Al thin-flim under-bump-metallization" J. Appl. Phys. Vol. 94, No. 9, 1 November, pp. 5665-5671(2003)
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  • 9
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    • Effect of contact metallization on electromigration reliability of Pb-free solder joints
    • Min Ding et al., "Effect of contact metallization on electromigration reliability of Pb-free solder joints", J. Appl. Phys. 99, 094906(2006)
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  • 10
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    • Studies on solder bump electromigration in Cu/Sn-3Ag-0.5Cu/Cu system
    • Yamanaka K et al., "Studies on solder bump electromigration in Cu/Sn-3Ag-0.5Cu/Cu system", Microelectron. Reliab., in press
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  • 12
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.