Ion sputtering rates of C, CrxCy, and Cr at different Ar+ ion incidence angles

Vacuum

Volumn 82, Issue 2 SPEC. ISS., 2007, Pages 116-120

  Zalar, A ^a   Kovac J ^a   Pracek B ^a   Panjan, P ^a   Ceh M ^a  

^a JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

AES depth profiling; Carbon; Chromium carbide; Sputtering rates; Sputtering yields

Indexed keywords

AMORPHOUS CARBON; AUGER ELECTRON SPECTROSCOPY; DEPTH PROFILING; GRAPHITE; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SUBSTRATES;

CHROMIUM CARBIDE; INCIDENCE ANGLES; SPUTTERING RATES; SPUTTERING YIELDS;

CHROMIUM COMPOUNDS;

EID: 35248871523     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.015     Document Type: Article

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