Models for predicting the index of refraction of compounds 193 and 589 nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Brainard, Robert L ^a   Kruger, Seth ^a   Block, Eric ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

193i; Immersion 193 nm lithography; Immersion fluids

Indexed keywords

IMMERSION 193 NM LITHOGRAPHY; IMMERSION FLUIDS;

COMPUTER SOFTWARE; LAPTOP COMPUTERS; LITHOGRAPHY; MATHEMATICAL MODELS; NANOTECHNOLOGY;

REFRACTIVE INDEX;

EID: 35248832992     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712431     Document Type: Conference Paper

References (11)

1. Burnett, John H.; Kaplan, Simon G.; Shirley, Eric L.; Tompkins, Paul J.; Webb, James E. "High-index materials for 193 nm immersion lithography" Proceedings of SPIE (2005), 5754, 611-621; Mulkens, Jan; Streefkerk, Bob; Hoogendorp, Martin; Moerman, Richard; Leenders, Martijn; de Jong, Fred; Stavenga, Marco; Boom, Herman. "Immersion lithography exposure systems: today's capabilities and tomorrow's expectations" Proceedings of SPIE (2005), 5754, 710-724.
2. Peng, Sheng; French, Roger H.; Qiu, Weiming; Wheland, Robert C.; Yang, Min; Lemon, Michael F.; Crawford, Michael K. "Second generation fluids for 193 nm immersion lithography" Proceedings of SPIE (2005), 5754, 427-434.
3. Vogel, Arthur I.; Cresswell, Wm. T.; Jeffrey, Geo. H.; Leicester, James. "Physical properties and chemical constitution. XXIV. Aliphatic aldoximes, ketoximes, and ketoxime O-alkyl ethers, N,N-dialkylhydrazines, aliphatic ketazines, mono- and dialkylaminopropiononitriles, alkoxypropionitriles, dialkyl azodiformates, and dialkyl carbonates. Bond parachors, bond refractions, and bond refraction coefficients" Journal of the Chemical Society, Abstracts (1952), 514-549.
4. Price, Charles C.; Gillis, Richard G. "Spectra and molecular refraction for some unsaturated sulfides, sulfoxides, and sulfones" Journal of the American Chemical Society (1953), 75 4750-3.
5. Padron, J. A.; Carrasco, R.; Pellon, R. F. "Molecular descriptor based on a molar refractivity partition using Randic-type graph-theoretical invariant" Journal of Pharmacy & Pharmaceutical Sciences (2002), 5(3), 258-265; Carrasco, R.; Padron, J. A.; Galvez, J. "Definition of a novel atomic index for QSAR: the refractotopological state" Journal of Pharmacy & Pharmaceutical Sciences (2004), 7(1), 19-26.
6. Irisawa, Jun; Okazoe, Takashi; Eriguchi, Takeshi; Yokokoji, Osamu; "The modeling of immersion liquid by using quantum chemical calculation" Proceedings of SPIE (2005), 5754, 1040-1048.
7. 193 using RIT Data, Cell V22: 2.1878*T22-1.5138
8. Kaplan, S.G.; Burnett, J.H.; "Optical properties of fluids for 248 and 193 nm immersion photolithograph" Applied Optics, (2006), 45, 1721-1724.
9. Zhou, Jianming; Fan, Yongfa; Bourov, Anatoly; Lafferty, Neal; Cropanese, Frank; Zavyalova, Lena; Estroff, Andrew; Smith, Bruce W. "Immersion lithography fluids for high NA 193 nm lithography" Proceedings of SPIE (2005), 5754, 630-637; B. Smith, Y. Fan, J. Zhou, A. Bourov, L. Zavyalova, E. Piscani, J. Park, D. Summers, F. Cropanese; http://www.microe.rit.edu/ research/lithography/research/fluids.htm
10. 193 value for decaline is from: Santillan, Julius; Otoguro, Akihiko; Itani, Toshiro; Fujii, Kiyoshi; Kagayama, Akifumi; Nakano, Takashi; Nakayama, Norio; Tamatani, Hiroaki; Fukuda, Shin. "A study of 193-nm immersion lithography using novel high refractive index fluids" Microelectronic Engineering (2006), 83(4-9), 651-654. The values of n-heptane and cyclohexane are from Paul Zimmerman through personal communication.
11. Ando, S. "DFT Calculations on Refractive Index Dispersion of Fluoro-compounds in the DUVUV-Visible Region"; J. Photopolymer Sci. Tech. (2006) 19, 351-360.