Immersion lithography fluids for high NA 193nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 630-637

  Zhou, Jianming ^a   Fan, Yongfa ^a   Bourov, Anatoly ^a   Lafferty, Neal ^a   Cropanese, Frank ^a   Zavyalova, Lena ^a   Estroff, Andrew ^a   Smith, Bruce W ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

193nm; High NA; Immersion fluid; Immersion lithography

Indexed keywords

193NM; HIGH NA; IMMERSION FLUID; IMMERSION LITHOGRAPHY;

LIGHT ABSORPTION; LIGHT REFRACTION; PHOSPHORIC ACID; REFRACTIVE INDEX; TRANSPARENCY;

PHOTOLITHOGRAPHY;

EID: 25144511897     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602533     Document Type: Conference Paper

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7. Y. Fan, A. Bourov, L. Zavyalova, J. Zhou, A. Estroff, N. Lafferty, B. W. Smith. Proc. SPIE 5754-204 (2005)