The modeling of immersion liquid by quantum chemical calculation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 1040-1048

  Irisawa, Jun ^a   Okazoe, Takashi ^a   Eriguchi, Takeshi ^a   Yokokoji, Osamu ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

193nm immersion lithography; Absorption spectra; Molecular modeling; Refractive index

Indexed keywords

ABSORPTION SPECTROSCOPY; ERRORS; FLUID DYNAMICS; MOLECULAR DYNAMICS; OPTICAL SYSTEMS; QUANTUM THEORY; REFRACTIVE INDEX;

193NM IMMERSION LITHOGRAPHY; ABSORPTION SPECTRA; MOLECULAR MODELING; QUANTUM CHEMICAL CALCULATIONS;

LITHOGRAPHY;

EID: 25144433742     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598703     Document Type: Conference Paper

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