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Volumn 6521, Issue , 2007, Pages

Modeling spatial gate length variation in the 0.2μm to 1.15mm separation range

Author keywords

Circuit performance; Gate length variation; Process control; Spatial correlation; Variability

Indexed keywords

CIRCUIT PERFORMANCE; GATE LENGTH VARIATION; SPATIAL CORRELATION; VARIABILITY;

EID: 35148876045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.710668     Document Type: Conference Paper
Times cited : (4)

References (10)
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  • 2
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    • Modeling Within-Die Gate Length Spatial Correlation for Process-Design Co-Optimization, Design and Process Integration for Microelectronic Manufacturing III
    • Feb
    • P. Friedberg, Y. Cao, J. Cain, R. Wang, J. Rabaey, and C. Spanos, "Modeling Within-Die Gate Length Spatial Correlation for Process-Design Co-Optimization," Design and Process Integration for Microelectronic Manufacturing III, Proceedings of SPIE vol. 5675, Feb. 2005.
    • (2005) Proceedings of SPIE , vol.5675
    • Friedberg, P.1    Cao, Y.2    Cain, J.3    Wang, R.4    Rabaey, J.5    Spanos, C.6
  • 3
    • 33745805383 scopus 로고    scopus 로고
    • Spatial Modeling of Micron-Scale Gate Length Variation, Data Analysis and Modeling for Patterning Control III
    • Feb
    • P. Friedberg, W. Cheung, C. Spanos, "Spatial Modeling of Micron-Scale Gate Length Variation," Data Analysis and Modeling for Patterning Control III, Proceedings of SPIE vol. 6155, Feb. 2006.
    • (2006) Proceedings of SPIE , vol.6155
    • Friedberg, P.1    Cheung, W.2    Spanos, C.3
  • 5
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    • Lake Shore 7500/9500 Series Hall System User's Manual, Appendix A, Hall Effect Measurements, pp. A.16-A.17, http://www.lakeshore. com/pdf_files/systems/Hall_Data_Sheets/A_Hall.pdf.
    • Lake Shore 7500/9500 Series Hall System User's Manual, Appendix A, "Hall Effect Measurements," pp. A.16-A.17, http://www.lakeshore. com/pdf_files/systems/Hall_Data_Sheets/A_Hall.pdf.
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    • Y. Shimizu et al, "Test Structure for Precise Statistical Characteristics Measurement of MOSFETs," Proc. IEEE 2002 Int. Conference on Microelectronic Test Structures, Vol 15, April 2002, pp. 49-54.
    • (2002) Proc. IEEE 2002 Int. Conference on Microelectronic Test Structures , vol.15 , pp. 49-54
    • Shimizu, Y.1
  • 10
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    • Calibre nmDRC, http://www.mentor.com/products/ic_nanometer_design/ mask_syn/calibre_drc/index.cfm.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.