Spatial modeling of micron-scale gate length variation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6155, Issue , 2006, Pages

  Friedberg, Paul ^a   Cheung, Willy ^a   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Circuit performance; Gate length variation; Process control; Spatial correlation; Variability

Indexed keywords

CIRCUIT PERFORMANCE; GATE LENGTH VARIATION; SPATIAL CORRELATION; VARIABILITY;

CIRCUIT THEORY; COMPUTER SIMULATION; MATHEMATICAL MODELS; MONTE CARLO METHODS; OPTICAL CORRELATION; PHOTOLITHOGRAPHY;

GATES (TRANSISTOR);

EID: 33745805383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656521     Document Type: Conference Paper

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