A short-pulsed laser cleaning system for EUVL tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Yonekawa, Masami ^a   Namba, Hisashi ^a   Hayashi, Tatsuya ^a   Watanabe, Yutaka ^a  

^a CANON INC   (Japan)

Author keywords

Defect; EUV mask; EUV reticle; In situ cleaning; Laser cleaning; Mo Si multilayer; Particle

Indexed keywords

CLEANING; DEFECTS; LASER PULSES; MASKS; MULTILAYERS; PULSED LASER APPLICATIONS; Q SWITCHED LASERS;

EUV MASKS; EUV RETICLES; IN-SITU CLEANING; LASER CLEANING; MO/SI MULTILAYERS;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148858057     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711357     Document Type: Conference Paper

References (11)

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