Line edge roughness characterization of sub-50nm structures using CD-SAXS: Round-robin benchmark results

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 2, 2007, Pages

  Wang, Chengqing ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Villarrubia, John S ^a,b   Choi, Kwang Woo ^a,b   Clarke, James S ^b   Rice, Bryan J ^b   Leeson, Michael ^b   Roberts, Jeanette ^b   Bristol, Robert ^b   Bunday, Benjamin ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c SEMATECH   (United States)

Author keywords

Critical dimension metrology; Extreme ultraviolet lithography; Line edge roughness; Scatterometry

Indexed keywords

CRITICAL DIMENSION METROLOGY; LINE EDGE ROUGHNESS; ROUND ROBIN BENCHMARK RESULTS; SCATTERING VECTORS;

ATOMIC FORCE MICROSCOPY; DATA ACQUISITION; MEASUREMENT THEORY; PATTERN RECOGNITION; SCANNING ELECTRON MICROSCOPY; WAVELENGTH; X RAY SCATTERING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148852649     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.725380     Document Type: Conference Paper

References (7)

1. R. L. Jones, T. Hu, E. K. Lin, W.-L. Wu, R. Kolb, D. M. Casa, P. J. Bolton, G. G. Barclay, Appl. Phys. Lett. 83, 4059 (2003).
2. T. Hu, R. L. Jones, W.-L. Wu, E. K. Lin, Q. Lin, D. Keane, S. Weigand, J. P. Quintana, J. Appl. Phys. 96, 83 (2004).
3. R. L. Jones, T. Hu, C. L. Soles, E. K. Lin, W.-L. Wu, D. M. Casa, A. Mahorowala, Proc. SPIE 5375, 191 (2004).
4. R. L. Jones, W.-L. Wu, C-Q Wang, E. K. Lin, K.-W Choi, B. J. Rice, G. M. Thompson, S. J. Weigand, D. T. Keane, Proc. SPIE 6152, 61520N (2006).
5. C. Wang, R. L. Jones, E. K. Lin, W.-L. Wu, submitted to Appl. Phys. Lett. (2007).
6. Bunday, B., McCormack, D., Bishop, M., Villarrubia, J., Vladar, A., Dixson, R., Vorburger, T., Orji, N, and Allgair, J. "Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness". Proceedings of the SPIE: Metrology, Inspection, and Process Control for Microlithography XVIII (2004), 515-533.
7. N. G. Orji, R. G. Dixson, A. Martinez, B. D. Bunday, J. A. Allgair, T. V. Vorburger "Progress on Implementation of a CD-AFM-Based Reference Measurement System," Journal of Micro/Nanolithography, MEMS and MOEMS, accepted for publication.