The impact of mask topography on CD control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 395-406

  Cobb, Jonathan L ^a   Roman, Bernard J ^a   Ivin, Vladimir ^b   Sarychev, M ^b  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b SOFT   (Russian Federation)

Author keywords

3D effects; 3D EMF simulation; CD control; Mask topography; RCWA; RET

Indexed keywords

3D EFFECTS; 3D-EMF SIMULATION; CD CONTROL; MASK TOPOGRAPHY; RCWA; RET;

AERIAL PHOTOGRAPHY; COMPUTER SIMULATION; FOURIER TRANSFORMS; IMAGE ANALYSIS; MONTE CARLO METHODS; STATISTICAL METHODS;

MASKS;

EID: 25144488065     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601175     Document Type: Conference Paper

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