Evaluation of extendibility for fourier diffraction theory for topographical mask structure under hyper NA lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 942-952

  Tanaka, Satoshi ^a   Mimotogi, Akiko ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Hyper NA; Mask topography effects; Oblique illumination; Shadowing effects

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGING SYSTEMS; INTEGRATED CIRCUIT MANUFACTURE; REFRACTIVE INDEX; RELAXATION PROCESSES;

HYPER NA; MASK TOPOGRAPHY EFFECTS; OBLIQUE ILLUMINATION; SHADOWING EFFECTS;

MASKS;

EID: 25144464405     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600447     Document Type: Conference Paper

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