Whole wafer imprint patterning using step and flash imprint lithography: A manufacturing solution for sub 100 nm patterning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Lentz, David ^a   Doyle, Gary ^a   Miller, Mike ^a   Schmid, Gerard ^a   Ganapathisuramanian, Maha ^a   Xiaoming, Lu ^a   Resnick, Doug ^a   LaBrake, Dwayne L ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

Conformal; Imprint lithography; Large area patterning; Nanoimprint lithography; NIL; S FIL; Step and flash imprint lithography

Indexed keywords

FLASH IMPRINT LITHOGRAPHY; LARGE AREA PATTERNING; ROOM TEMPERATURE;

CROSSLINKING; ERROR ANALYSIS; ETCHING; FEATURE EXTRACTION; LITHOGRAPHY; MICROFABRICATION; TOPOGRAPHY;

SILICON WAFERS;

EID: 35048828837     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.720671     Document Type: Conference Paper

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