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Volumn , Issue , 2007, Pages 259-262

Copper metallization for power devices

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTROPLATING; METALLIZING; POWER ELECTRONICS; THICKNESS MEASUREMENT;

EID: 34748829076     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2007.375112     Document Type: Conference Paper
Times cited : (4)

References (8)
  • 2
    • 0032166781 scopus 로고    scopus 로고
    • Damascene copper electroplating for chip interconnections
    • September
    • P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, H. Deligianni, "Damascene copper electroplating for chip interconnections," IBM J. Res. & Dev., vol. 42, no. 5, pp. 567-574, September 1998.
    • (1998) IBM J. Res. & Dev , vol.42 , Issue.5 , pp. 567-574
    • Andricacos, P.C.1    Uzoh, C.2    Dukovic, J.O.3    Horkans, J.4    Deligianni, H.5
  • 4
    • 0030703837 scopus 로고    scopus 로고
    • A path: From electroplating through lithographic masks in electronics to LIGA in MEMS
    • L. T. Romankiw, "A path: from electroplating through lithographic masks in electronics to LIGA in MEMS," Electrochimica Acta, vol. 42, nos. 20-22, pp. 2985-3005, 1997.
    • (1997) Electrochimica Acta , vol.42 , Issue.20-22 , pp. 2985-3005
    • Romankiw, L.T.1
  • 6
    • 8344230809 scopus 로고    scopus 로고
    • B. Kim, T. Ritzdorf, S. Christian, R. Forman, MEMS, head, and packaging applications using through-mask Cu deposition, Solid State Technology, 47, no. 10, pp. 57-58, 60, 63, October, 2004.
    • B. Kim, T. Ritzdorf, S. Christian, R. Forman, "MEMS, head, and packaging applications using through-mask Cu deposition," Solid State Technology, vol. 47, no. 10, pp. 57-58, 60, 63, October, 2004.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.