Fabrication of magnetic force microscopy probes via localized electrochemical deposition of cobalt

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 5, 2007, Pages

  Rolandi, Marco ^a,b   Okawa, David ^a   Backer, Scott A ^a   Zettl, Alex ^a,b   Fŕchet, Jean M J ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTROCHEMICAL CELLS; ELECTROCHEMISTRY; MAGNETIC FORCE MICROSCOPY;

FLUID CELLS; PHASE ELECTROCHEMICAL DEPOSITION;

COBALT;

EID: 34648821260     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2766935     Document Type: Article

References (19)

1. J. I. Martin, J. Nogues, K. Liu, J. L. Vicent, and I. K. Schuller, J. Magn. Magn. Mater. 256, 449 (2003).
2. D. Rugar, H. J. Mamin, P. Guethner, S. E. Lambert, J. E. Stern, I. McFadyen, and T. Yogi, J. Appl. Phys. 68, 1169 (1990).
3. X. Zhu and P. Grutter, MRS Bull. 29, 457 (2004).
4. R. B. Proksch, T. E. Schaffer, B. M. Moskowitz, E. D. Dahlberg, D. A. Bazylinski, and R. B. Frankel, Appl. Phys. Lett. 66, 2582 (1995).
5. P. Grutter, Appl. Phys. Lett. 57, 1820 (1990).
6. C. Schonenberger and S. F. Alvarado, Z. Phys. B: Condens. Matter 80, 373 (1990).
7. G. N. Philips, M. Siekman, L. Abelmanna, and J. C. Lodder, Appl. Phys. Lett. 81, 865 (1990).
8. M. R. Koblischka, U. Hartmann, and T. Sulzbach, Thin Solid Films 428, 93 (2003).
9. A. B. H. Tay and J. T. L. Thong, Rev. Sci. Instrum. 75, 3248 (2004).
10. Y. M. Lau, P. C. Chee, J. T. L. Thong, and V. Ng, J. Vac. Sci. Technol. A 4, 1295 (2002).
11. G. Yang, Appl. Phys. Lett. 87, 123507 (2005).
12. Z. F. Deng, E. Yenilmez, J. Leu, J. E. Hoffman, E. W. J. Straver, H. J. Dai, and K. A. Moler, Appl. Phys. Lett. 85, 6263 (2004).
13. H. Kuramochi, T. Uzumaki, M. Yusutake, A. Tanaka, H. Akinaga, and H. Yokohama, Nanotechnology 16, 24 (2005).
14. N. Yoshida, M. Yasutake, T. Arie, S. Akita, and Y. Nakayama, Jpn. J. Appl. Phys., Part 1 41, 5013 (2002).
15. A. R. Champagne, A. J. Couture, F. Kuemmeth, and D. C. Ralph, Appl. Phys. Lett. 82, 1111 (2003).
16. C. Cheng and D. T. Haynie, Appl. Phys. Lett. 87, 263112 (2005).
17. S. Sawada, Y. Masuda, P. X. Zhu, and K. Koumoto, Langmuir 22, 332 (2006).
18. M. L. Munford, M. L. Sartorelli, L. Seligman, and A. A. Pasa, J. Electrochem. Soc. 149, C274 (2002).
19. I. Saito, R. Sunahara, Y. Rheem, and S. Ishio, IEEE Trans. Magn. 41, 4394 (2005).