Analysis of magnetron sputtered boron oxide films

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8723-8727

  Buc, Dalibor ^a   Bello, Igor ^b   Caplovicova, Maria ^c   Mikula, Milan ^a   Kovac, Jaroslav ^a   Hotovy, Ivan ^a   Chong, Yat Min ^b   Siu, Guei Gu ^b  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c Physics and Informatics   (Slovakia)

Author keywords

Boron oxide; Electron microscopy; FTIR; Reactive magnetron sputtering

Indexed keywords

AMORPHOUS FILMS; BORON COMPOUNDS; DEPOSITION; ELECTRON MICROSCOPY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS MIXTURES; MAGNETRON SPUTTERING; NANOHARDNESS;

BORON OXIDE; COEXISTENCE; ELECTRON MICROSCOPIC ANALYSIS;

THIN FILMS;

EID: 34548850338     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.04.002     Document Type: Article

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