Effect of oxidation on the chemical bonding structure of PECVD SiN x thin films

Journal of Applied Physics

Volumn 100, Issue 12, 2006, Pages

  Jehanathan, Neerushana ^a   Liu, Yinong ^a   Walmsley, Byron ^a   Dell, John ^a   Saunders, Martin ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING STRUCTURES; SINX; SIO2;

THIN FILMS;

EID: 33846085563     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2402581     Document Type: Article

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