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Volumn 51, Issue 9, 2007, Pages 1211-1215

Calculation of the phonon-limited mobility in silicon Gate All-Around MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; ELECTRON MOBILITY; ELECTRON TRANSPORT PROPERTIES; NANOWIRES; SILICON; SILICON ON INSULATOR TECHNOLOGY; TWO DIMENSIONAL;

EID: 34548535360     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2007.07.025     Document Type: Article
Times cited : (17)

References (13)
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    • note
    • w, variable depending on the effective field, the form factor calculated in DGSOI inversion layers is lower than that corresponding to SGSOI for the same thicknesses or for bulk inversion layers. This result is important in explaining the expected increase in electron mobility in DGSOI compared to SGSOI or bulk MOSFETs.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.