Lateral scalability limits of silicon conduction channels

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 3911-3916

  Trellakis, A ^a   Ravaioli, U ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012734283     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371307     Document Type: Article

References (11)

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