Laser ablation of SiO2 for locally contacted Si solar cells with ultra-short pulses

Progress in Photovoltaics: Research and Applications

Volumn 15, Issue 6, 2007, Pages 521-527

  Engelhart, Peter ^a   Hermann, Sonja ^a   Neubert, Tobias ^a   Plagwitz, Heiko ^a   Grischke, Rainer ^a   Meyer, Rüdiger ^a   Klug, Ulrich ^b   Schoonderbeek, Aart ^b   Stute, Uwe ^b   Brendel, Rolf ^a,c  

^a INSTITUTE FOR SOLAR ENERGY RESEARCH HAMELIN ISFH   (Germany)

^b LASER ZENTRUM HANNOVER E V   (Germany)

^c LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

Laser ablation; Laser technology; Si solar cells; Ultra short pulse laser

Indexed keywords

EVAPORATION; LASER ABLATION; PASSIVATION; SILICA; THERMAL DIFFUSION; ULTRASHORT PULSES;

EVAPORATED ALUMINIUM; LASER TECHNOLOGY; PASSIVATING LAYERS; PULSE DURATION;

SILICON SOLAR CELLS;

EID: 34548458496     PISSN: 10627995     EISSN: 1099159X     Source Type: Journal    
DOI: 10.1002/pip.758     Document Type: Article

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