Pressure-dependent rate coefficients of chemical reactions involving Si2H4 isomerization from QRRK calculations

Journal of Analytical and Applied Pyrolysis

Volumn 80, Issue 2, 2007, Pages 460-470

  Dollet, A ^a   de Persis, S ^b  

^a Centre National de la Recherche Scientifique   (France)

^b CNRS   (France)

Author keywords

Chemical vapor deposition; Disilene; Isomerization reactions; Kinetics; Pressure dependence; QRRK; Silane pyrolysis

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GASES; ISOMERIZATION; PRESSURE EFFECTS; PYROLYSIS; SILANES; TEMPERATURE MEASUREMENT;

PRESSURE-DEPENDENT RATE COEFFICIENTS; QRRK CALCULATIONS; QUANTUM RICE RAMSPERGER KASSEL THEORY;

SILICON;

EID: 34548329833     PISSN: 01652370     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jaap.2007.06.003     Document Type: Article

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