Modification of trap distributions in anodic aluminum tunnel barriers

Journal of the Electrochemical Society

Volumn 154, Issue 10, 2007, Pages

  Hassel, Achim Walter ^a,c   Diesing, Detlef ^b  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b UNIVERSITY OF DUISBURG ESSEN   (Germany)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; ELECTROCHEMISTRY; ELECTROMIGRATION; POLARIZATION; SOLID STATE DEVICES; THICKNESS MEASUREMENT;

ALUMINUM TUNNEL BARRIERS; ELECTROMIGRATIVE ANNEALING; POTENTIOSTATIC POLARIZATION; TRAP DISTRIBUTIONS;

THIN FILMS;

EID: 34548290459     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2766646     Document Type: Article

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