Development of anodic coatings on aluminium under sparking conditions in silicate electrolyte

Corrosion Science

Volumn 49, Issue 2, 2007, Pages 672-693

  Monfort, F ^a   Berkani, A ^a   Matykina, E ^a   Skeldon, P ^a   Thompson, G E ^a   Habazaki, H ^b   Shimizu, K ^c  

^a UNIVERSITY OF MANCHESTER   (United Kingdom)

^b HOKKAIDO UNIVERSITY   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

A. Aluminium; C. Anodic films; C. Oxide coatings

Indexed keywords

ALUMINUM; ANODIC OXIDATION; CONCENTRATION (PROCESS); DEPOSITION; ELECTROLYTES; SCANNING ELECTRON MICROSCOPY; SILICATES;

ANODIC FILMS; COATING THICKNESS; METASILICATES; OXIDE COATINGS;

PROTECTIVE COATINGS;

ALUMINUM; ANODIC OXIDATION; CONCENTRATION (PROCESS); DEPOSITION; ELECTROLYTES; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SILICATES;

EID: 33751401109     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2006.05.046     Document Type: Article

References (42)

1. Wei T., and Yan F. Jun Tian. J. Alloys Compd. 389 (2005) 169
2. Birss V., Xia S., Yue R., and Rateick Jr. R.G. J. Electrochem. Soc. 151 (2004) B1
3. Huang P., and Xu K.-W. Yong Han. Mater. Lett. 59 (2005) 185
4. Rudnev V.S.D., Gordienko P.S., Kurnosova A.G., and Kovtun M.V. Fiz. Khim. Obra. Mater. 24 (1990) 64
5. Yerokhin A.L., Snizhko L.O., Gurevina N.L., Leyland A., Pilkinton A., and Matthews A. Surf. Coat. Technol. 177-178 (2004) 779
6. Markov G.A., Slonova A.J., and Terleeva O.P. Prot. Met. 33 (1997) 257
7. Lukiyanchuk I.V., Rudnev V.S., Kuryavyi V.G., and Gordienko P.S. Russ. J. Appl. Chem. 77 (2004) 1472
8. Wu H.-H., Jin Z.-S., Long B.-Y., Yu F.-R., and Lu X.-Y. Chin. Phys. Lett. 20 (2003) 1815
9. Sundararajan G., and Rama Krishna L. Surf. Coat. Technol. 167 (2003) 269
10. Voevodin A.A., Yerokhin A.L., Lyubimov V.V., Donley M.S., and Zabinski J.S. Surf. Coat. Technol. 86-87 (1996) 516
11. Yerokhin A.L., Voevodin A.A., Lyubimov V.V., Zabinski J.S., and Donley M.S. Surf. Coat. Technol. 110 (1998) 140
12. Xue W., Deng Z., Lai Y., and Chen R. J. Am. Ceram. 81 (1998) 1365
13. Yang G., Lu X., Bai Y., Cui H., and Jin Z. J. Alloys Compd. 345 (2002) 196
14. Snizhko L.O., Yerokhin A.L., Pilkington A., Gurevina N.L., Misnyankin D.O., Leyland A., and Matthews A. Electrochim. Acta 49 (2004) 2085
15. Tian J., Luo Z., Qi S., and Sun X. Surf. Coat. Technol. 154 (2002) 1
16. Nie X., Meletis E.I., Jiamg J.C., Leyland A., Yerokhin A.L., and Matthews A. Surf. Coat. Technol. 149 (2002) 245
17. Madey T.E., Wagner C.D., and Joshi A. J. Electron Spectrosc. 10 (1977) 359
18. Sarapatka T.J. Chem. Phys. Lett. 212 (1993) 39
19. Nylund A., and Oleford I. Surf. Interface Anal. 21 (1994) 283
20. Venezia A.M., Rossi A., Liotta L.F., Martorana A., and Deganello G. Appl. Catal. A 147 (1996) 81
21. Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilonberg G.E. Handbook of X-Ray Photoelectron Spectroscopy (1979), Perkin-Elmer Corporation
22. Morgan W.E., and Van Wazer J.R. J. Phys. Chem. 77 (1973) 96
23. Namiki A., Tanimoto K., Nakamura T., Ohtake N., and Suzaki T. Surf. Sci. 222 (1989) 530
24. Hollinger G., Jugnet Y., Pertosa P., and Duc T.M. Chem. Phys. Lett. 36 (1975) 441
25. Roy Chowdhuri A., and Takoudis C.G. Thin Solid Films 446 (2004) 155
26. 2 plasma deposits using high resolution XPS, 43rd AVS National Symposium, Philiadelphia, PA, October 14-18, 1996.
27. Nykyforchyn H.M., Klapkiv M.D., and Posuvailo V.M. Surf. Coat. Technol. 100-101 (1998) 219
28. Timoshenko A.V., Gut S., Opara B.K., Pshibylovich K., and Magurova Yu.V. Prot. Met. 30 (1994) 149
29. Morlidge J.R., Skeldon P., Thompson G.E., Habazaki H., Shimizu K., and Wood G.C. Electrochim. Acta 44 (1999) 2423
30. Snezhko L.A., Pavlyus S.G., and Chernenko V.I. Prot. Met. 20 (1984) 243
31. Brown F., and Mackintosh W.D. J. Electrochem. Soc. 120 (1973) 1096
32. Pringle J.P.S. Electrochim. Acta 25 (1980) 1403
33. Amsel G., and Samuel D. J. Phys. Chem. Solids 23 (1962) 1707
34. Wood G.C., Skeldon P., Thompson G.E., and Shimizu K. J. Electrochem. Soc. 143 (1996) 74
35. Lu Q., Skeldon P., Thompson G.E., Masheder D., Habazaki H., and Shimizu K. Corros. Sci. 46 (2004) 2817
36. Ono S., Baba M., Shimoyama M., and Asoh H. In: Birss V., Burke L., Hillman A.R., and Lillard R.S. (Eds). Proc. Surface Oxide Films (2004), The Electrochemical Society, Pennington 133
37. Harkness A.C., and Young L. Can. J. Chem. 44 (1966) 2409
38. Kudo T., and Alwitt R.S. Electrochim. Acta 23 (1978) 341
39. Crevecoeur C., and De Wit H.J. J. Electrochem. Soc. 134 (1987) 808
40. Leach J.S.L., and Pearson B.R. Corros. Sci. 28 (1988) 43
41. Alwitt R.S., Ortega C., Thorne N., and Siejka J. J. Electrochem. Soc. 135 (1988) 2695
42. Shimizu K., Thompson G.E., and Wood G.C. Thin Solid Films 92 (1982) 231