Aluminum oxide tunnel junctions: Influence of preparation technique, sample geometry and oxide thickness

Thin Solid Films

Volumn 342, Issue 1, 1999, Pages 282-290

  Diesing, D ^a   Hassel, A W ^a   Lohrengel, M M ^a  

^a Inst Phys Chem und Elektrochem   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; CORROSION RESISTANCE; ELECTROLYTES; OXIDES; REDOX REACTIONS; SILVER; SPECTROSCOPY; TUNNEL JUNCTIONS; VAPOR DEPOSITION;

ALUMINUM OXIDE; HOT ELECTRONS; PHYSICAL VAPOR DEPOSITION (PVD);

METALLIC FILMS;

EID: 0032635653     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01427-8     Document Type: Article

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