Cleaning of photomask substrates using CO2 snow

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 600-608

  Brandt, Werner V ^a  

^a Eco Snow Systems   (United States)

Author keywords

Binary; Cleaning; CO2; Dry; Environment; Particles; Phase sh ift; Photomask; Snow; Sub micron

Indexed keywords

CARBON DIOXIDE; CONTAMINATION; ENVIRONMENTAL IMPACT; FIBER OPTICS; PHASE SHIFT; PHOTOLITHOGRAPHY; SNOW;

SNOW CLEANING;

MASKS;

EID: 0035765776     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458340     Document Type: Conference Paper

References (6)

1. International Technology Roadmap for Semiconductors (ITRS) 2000 report.
2. Service R.F., "Optical Lithography Goes to Extremes - and Beyond", Science, Vol. 293, 785-786, 2001
3. W. Krone-Schmidt, E.S. Dimilia, M.J. Slattery, US Patent #5,409,418, Apr., 25, 1995
4. J.D. Sneed, W. Krone-Schmidt, M.J. Slattery, H.S. Bowen, US Patent #5,354,384 Oct., 11, 1994
5. Hakanson, A., Garg N., Borden M.R., Chung H.F., "Removing Post-CMP Residue Through Carbon Dioxide Snow Cleaning", Micro, Vol. 18, 75-85, 2000.
6. Kosic T., Palser J.L., "Carbon Dioxide Meets the Challenges of Precision Cleaning", Solid State Technology, May Supplement, S7, 1998.