Projection photolithography

Optics and Photonics News

Volumn 11, Issue 2, 2000, Pages 36-40

  Mansuripur, Masud ^a   Liang, Rongguang ^b  

^a University of Arizona   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004806552     PISSN: 10476938     EISSN: None     Source Type: Trade Journal    
DOI: 10.1364/OPN.11.2.000036     Document Type: Article

References (9)

1. M.D. Levenson, "Wavefront engineering for photolithography," Physics Today, 28-36, July 1993.
2. M.D. Levenson, "Extending the lifetime of optical lithography technologies with wavefront engineering," Jpn. J. Appl. Phys. 33, 6765-73 (1994).
3. M.D. Levenson, "Wavefront engineering from 500 nm to 100 nm CD," in Emerging Lithographic Technologies, SPIE 3048, 2-13 (1997).
4. T. Terasawa, N. Hasegawa, T. Kurosaki, and T. Tanaka, "0.3-micron optical lithography using a phase-shitting mask," SPIE1088, 25-33 (1989).
5. N. Hasegawa, T. Terasawa, T. Tanaka, and T. Kurosaki, "Submicron optical lithography using phase-shifting mask," Electro-chem. and Ind. Phys. Chem. 58, 330-5 (1990).
6. M.D. Levenson, N.S. Viswanathan and R.A. Simpson, "Improving resolution in photolithography with a phase-shifting mask," IEEE Transactions on Electron Devices, ED-29, 1828-36 (1982).
7. M. Shibuya, "Projection master for transmitted illumination," Japanese Patent Gazette # Showa 62-50811, application dated 9/30/80, issued 10/27/87.
8. The computer simulations reported in this article were performed by DIFFRACT™, a product of MM Research, Inc., Tucson, Arizona.
9. M.D. Levenson, private communication.