Evaluation of errors in feedback control based on persistence prediction in model-based process controller system for deep sub-100 nm gate fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 A, 2006, Pages 7645-7654

  Goto, Takeshi K ^a,b   Makabe, Toshiaki ^a  

^a KEIO UNIVERSITY   (Japan)

^b FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Advanced process control (APC); CMOS logic chip; Critical dimension (CD); Feedback control; Feedforward control; Gate fabrication; MOSFET; Plasma etching

Indexed keywords

CMOS INTEGRATED CIRCUITS; ERROR ANALYSIS; FEEDFORWARD CONTROL; GATES (TRANSISTOR); MOSFET DEVICES; PLASMA ETCHING; PREDICTIVE CONTROL SYSTEMS; PROCESS CONTROL;

ADVANCED PROCESS CONTROL (APC); CRITICAL DIMENSION (CD); MEASUREMENT TOOLS;

FEEDBACK CONTROL;

EID: 34547925641     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7645     Document Type: Article

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