Investigation of Al- and Ag-based top-emitting organic light-emitting diodes with metal oxides as hole-injection layer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 3 A, 2007, Pages 1033-1036

  Zhu, Xiuling ^a   Sun, Jiaxin ^a   Yu, Xiaoming ^a   Wong, Man ^a   Kwok, Hoi Sing ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Al or Ag anode; HIL; Metal oxide; Power efficiency; TOLED

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; INTERFACES (MATERIALS); LUMINANCE; MOLYBDENUM COMPOUNDS; OXIDES; SILVER;

CURRENT EFFICIENCY; HOLE INJECTION LAYER (HIL); METAL OXIDES; POWER EFFICIENCY;

ORGANIC LIGHT EMITTING DIODES (OLED);

EID: 34547922855     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1033     Document Type: Article

References (26)

1. G. Parthasarathy, C Adachi, P. E. Burrows, and S. R. Forrest: Appl. Phys. Lett. 76 (2000) 2128.
2. M.-H. Lu, M. S. Weaver, T. X. Zhou, M. Rothman, R. C. Kwong, M. Hack, and J. J. Brown: Appl. Phys. Lett. 81 (2002) 3921.
3. S. F. Hsu, C. C. Lee, S. W. Hwang, and C H. Chan: Appl. Phys. Lett. 86 (2005) 253508.
4. H. Kanno, Y. Sun, and S. F. Forrest: Appl. Phys. Lett. 86 (2005) 263502.
5. G. B. Levy, W. Evans, J. Ebner, P. Farrell, M. Hufford, B. H. Allison, D. Wheeler, H. Lin, O. Prache, and E. Naviasky: IEEE J. Solid-State Circuits 37 (2002) 1879.
6. H. S. Shin, J. B. Koo, J. K. Jeong, Y. G. Mo, H. K. Chung, J. H. Cheon, J. H. Choi, K. M. Kim, J. H. Hur, S. H. Park, S. K. Kim, and J. Jang: SID Int. Symp. Dig. Tech. Pap. 36 (2005) 1642.
7. Z. Xie, L. S. Hung, and F. Zhu: Chem. Phys. Lett. 381 (2003) 691.
8. H. Riel, S. Karg, T. Beierlein, W. Rieß, and K. Neyts: J. Appl. Phys. 94 (2003) 5290.
9. C. Qiu, H. Peng, H. Chen, Z. Xie, M. Wong, and H. Kwok: IEEE Trans. Electron Devices 51 (2004) 1207.
10. C W. Chen, P. Y. Hsieh, H. H. Chiang, C L. Lin, H. M. Wu, and C. C. Wu: Appl. Phys. Lett. 83 (2003) 5127.
11. J. Y. Lee: Appl. Phys. Lett. 88 (2006) 073512.
12. S. Tokito, K. Noda, and Y. Taga: J. Phys. D 29 (1996) 2750.
13. H. Peng, X. Zhu, J. Sun, Z. Xie, S. Xie, M. Wong, and H. Kwok: Appl. Phys. Lett. 87 (2005) 173505.
14. M. Matsumura, Y. Jinde, T. Akai, and T. Kimura: Jpn. J. Appl. Phys. 35 (1996) 5735.
15. V. Heine: Phys. Rev. 138 (1965) A1689.
16. Y. C Yeo, T. J. King, and C Hu: J. Appl. Phys. 92 (2002) 7266.
17. C Ohler, C Daniels, A. Forster, and H. Luth: Phys. Rev. B 58 (1998) 7864.
18. A. Yagishita, T. J. King, and J. Bokor: Jpn. J. Appl. Phys. 43 (2004) 1713.
19. W. Mönch: J. Vac. Sci. Technol. B 14 (1996) 2985.
20. W. Mönch: Phys. Rev. Lett. 58 (1987) 1260.
21. N. Miyata, T. Suzuki, and R. Ohyama: Thin Solid Films 281-282 (1996) 218.
22. E. E. Khawaja, S. M. A. Durrani, and M. A. Daous: J. Phys.: Condens. Matter 9 (1997) 9381.
23. M. Losurdo, D. Barreca, G. Bruno, and E. Tondello: Thin Solid Films 384 (2001) 58.
24. H. Peng, J. Sun, X. Zhu, X. Yu, M. Wong, and H. S. Kwok: Appl. Phys. Lett. 88 (2006) 073517.
25. C. L. Lin, H. W. Lin, and C C Wu: Appl. Phys. Lett. 87 (2005) 021101.
26. W. Rieß, H. Riel, P. F. Seidler, and H. Vestweber: Synth. Met. 99 (1999) 213.