A practical method of extracting the photoresist exposure parameters by using a dose-to-clear swing curve

Journal of the Korean Physical Society

Volumn 42, Issue SPEC., 2003, Pages

  Kim, Hyoung Hee ^a   Yoo, Ji Yong ^a   Park, Seung Wook ^a   Kwon, Young Keun ^a   An, Ilsin ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemically amplified resist; Dill exposure ABC parameter; Doseto clear swing curve; Photolithography simulation

Indexed keywords

EID: 0037305574     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (4)

1. Young-Soo Sohn, Eun-Mi Lee, Moon-Gyu Sung, Young-Mi Lee, Heung-Jin Park, Ilsin An and Hye-Keun Oh, J. Korean Phys. Soc. 39, 152 (2001).
2. Ilsin An and Hye-Keun Oh, J. Korean Phys. Soc. 29, 370 (1996).
3. Stephen H. Thornton and Chris A. Mack, SPIE 2726, 223 (1996).
4. Hye-Keun Oh, Young-soo Sohn, Moon-Gyu Sung, Young-Mi Lee, Eun-Mi Lee and Ilsin-An, J. Korean Phys. Soc. 35, 734 (1999).