Optical characterization of titanium-vanadium oxide films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 2, 2007, Pages 621-626

  Kakiuchida, Hiroshi ^a   Jin, Ping ^a   Okada, Masahisa ^a   Tazawa, Masato ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Optical constant; Rf magnetron sputtering; SEM; Spectroscopic ellipsometry; Thermochromism; Titanium dioxide; Vanadium dioxide; XRD

Indexed keywords

MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ELLIPSOMETRY; VANADIUM COMPOUNDS; X RAY DIFFRACTION;

OPTICAL CONSTANT; RF MAGNETRON SPUTTERING; THERMOCHROMISM; VANADIUM DIOXIDE;

TITANIUM DIOXIDE;

EID: 34547886197     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.621     Document Type: Article

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