Photoluminescence imaging of multicrystalline Si wafers during HF etching

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 46, Issue 12-16, 2007, Pages

  Sugimoto, Hiroki ^a   Tajima, Michio ^a  

^a JAPAN AEROSPACE EXPLORATION AGENCY   (Japan)

Author keywords

HF etching; Imaging; Multicrystalline SI; Photoluminescence; PL; Solar cells; Surface treatment

Indexed keywords

DEFECTS; ETCHING; PHOTOLUMINESCENCE; SILICON WAFERS;

HF ETCHING; MULTICRYSTALLINE SI;

SOLAR CELLS;

EID: 34547885018     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.L339     Document Type: Article

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