Self-formation of Ti-rich interfacial layers in Cu(Ti) alloy films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 4 B, 2007, Pages 1942-1946

  Ito, Kazuhiro ^a   Tsukimoto, Susumu ^a   Murakami, Masanori ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Barrier layer; Cu(Ti) alloy film; Reaction; Resistivity; Self formation

Indexed keywords

ANNEALING; COPPER ALLOYS; ELECTRIC CONDUCTIVITY; MICROSTRUCTURE; SILICON NITRIDE; SUBSTRATES;

ALLOY FILMS; BARRIER LAYERS; SELF FORMATION;

THIN FILMS;

EID: 34547875463     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.1942     Document Type: Article

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