Photoluminescence from photochemically etched silicon

Solar Energy Materials and Solar Cells

Volumn 76, Issue 3, 2003, Pages 263-279

  Marotti, R E ^a   Quagliata, E ^a   Dalchiele, E A ^a  

^a INSTITUTO DE FÍSICA   (Uruguay)

Author keywords

Photochemical etching; Photoluminescence; Porous silicon

Indexed keywords

ELECTRIC CONDUCTIVITY; ETCHING; HELIUM NEON LASERS; MONOCHROMATORS; PHOTOCHEMICAL REACTIONS; PHOTOLUMINESCENCE; POROUS SILICON; QUANTUM THEORY; SILICON WAFERS; SOLUTIONS;

PHOTOCHEMICAL ETCHING;

SOLAR CELLS;

EID: 0037474809     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00279-9     Document Type: Article

References (34)

1. Soref R. MRS Bull. 23(4):1998;20
2. S. Coffa, G. Franzo, F. Priolo, MRS Bull. 25
3. L. Tsybeskov, MRS Bull. 33
4. E.A. Fitzgerald, L.C. Kimerling, MRS Bull. 39.
5. Cullis A.G., Canham L.T., Calcott P.D.J. J. Appl. Phys. Lett. 82:1997;909.
6. Marotti R.E., Rondoni A., Quagliata E., Dalchiele E.A. Phys. Status Solidi (B). 220:1999;319.
7. Canham L.T. Appl. Phys. Lett. 57:1990;1046.
8. Lehmann V., Gösele U. Appl. Phys. Lett. 58:1991;856.
9. Yoffee A.D. Adv. Phys. 43:1993;173.
10. Kore L., Bosman G. Sol. Energy Mater. Sol. Cells. 57:1999;31.
11. L. Canham (Ed.), Properties of Porous Silicon, EMIS Data reviews Series, No. 18, INSPEC, London, 1997.
12. Smith R.L., Collins S.D. J. Appl. Phys. 71:1992;R1.
13. Lehmann V. J. Electrochem. Soc. 140:1993;2836.
14. Colinge J.P. MRS Bull. 23(12):1998;16
15. K. Izumi, MRS Bull. 20
16. S. Krause, M. Aric, P. Roitman, MRS Bull. 25
17. C.A. Desmond-Colinge, U. Gosele, MRS Bull. 30
18. Yamamoto N., Takai H. Thin Solid Films. 388:2001;138.
19. Givant A., Shappir J., Sáar A. Appl. Phys. Lett. 73:1998;3150.
20. Sarathy J., Shih S., Jung K., Tsai C., Li K.-H., Kwong D.-L., Campbell J., Yau S.-L., Bard J. Appl. Phys. Lett. 60:1992;1532.
21. Shih S., Jung K.H., Hsieh T.Y., Sarathy J., Campbell J.C., Kwong D.L. Appl. Phys. Lett. 60:1992;1863.
22. Noguchi N., Suemune I. Appl. Phys. Lett. 62:1993;1429.
23. Andersen O.K., Frello T., Veje E. J. Appl. Phys. 78:1995;6189.
24. Ngan M.L., Lee K.C., Cheah K.W. J. Appl. Phys. 83:1998;1637.
25. Lérondel G., Romenstain R., Vial J.C., Thönissen M. Appl. Phys. Lett. 71:1997;196.
26. Starovoitov A., Bayliss S. Appl. Phys. Lett. 73:1998;1284.
27. Koker L., Kolasinski K.W. J. Appl. Phys. 86:1999;1900.
28. Birner A., Wehrspohn R.B., Gösele U.M., Busch K. Adv. Mater. 13:2001;377.
29. Pavesi L. Riv. Nuovo Cimento. 20:1997;1.
30. Yamamoto N., Sumiya A., Takai H. Mater. Sci. Eng. B. 69-70:2000;205.
31. Yamamoto N., Takai H. Thin Solid Films. 359:2000;184.
32. Lehmann V., Föll H. J. Electrochem. Soc. 135:1988;2831.
33. Kanemitsu Y. Phys. Rep. 263:1995;1.
34. Pankove J.I. Optical Processes in Semiconductors. 1971;Dover Publications Inc. New York.