Effect of oblique-angle deposition on early stage of Fe-Si growth

Thin Solid Films

Volumn 515, Issue 22, 2007, Pages 8277-8280

  Harada, Hidehiko ^a   Jomori, Shinji ^a   Suzuki, Motofumi ^a   Kinoshita, Kohei ^a   Nakajima, Kaoru ^a   Kimura, Kenji ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Ion channeling; Iron silicide; Oblique angle deposition; Rutherford backscattering spectroscopy

Indexed keywords

GROWTH (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICIDES; SILICON;

ION CHANNELING; IRON SILICIDE; OBLIQUE-ANGLE DEPOSITION;

IRON ALLOYS;

EID: 34547798949     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.064     Document Type: Article

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