Formation of iron silicide on Si(001) studied by high resolution Rutherford backscattering spectroscopy

Thin Solid Films

Volumn 461, Issue 1, 2004, Pages 131-135

  Kinoshita, K ^a   Imaizumi, R ^a   Nakajima, K ^a   Suzuki, M ^a   Kimura, K ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Ion channeling; Iron silicide; Rutherford backscattering spectroscopy; Solid phase reaction

Indexed keywords

ANNEALING; COMPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; DIFFUSION; LATTICE CONSTANTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SILICON COMPOUNDS; TEMPERATURE CONTROL;

ION CHANNELING; IRON SILICIDE; SOLID PHASE REACTION; SUBSURFACE;

IRON COMPOUNDS;

EID: 2942642322     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.086     Document Type: Conference Paper

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