A comparison between bottom contact and top contact all organic field effect transistors assembled by soft lithography

Thin Solid Films

Volumn 515, Issue 19 SPEC. ISS., 2007, Pages 7551-7555

  Cosseddu, P ^a,b   Bonfiglio, A ^a,b  

^a UNIVERSITY OF CAGLIARI   (Italy)

^b CNR Consiglio Nazionale delle Ricerche   (Italy)

Author keywords

AFM; OFETs; Polymer; Soft lithography

Indexed keywords

CAPACITANCE; GATE DIELECTRICS; INTERFACES (MATERIALS); LITHOGRAPHY; POLYSTYRENES; SPIN COATING;

ALL-ORGANIC FIELD EFFECT TRANSISTORS (OFET); PARASITIC CAPACITANCE EFFECTS; SEMICONDUCTING LAYER; SERIES CONTACT RESISTANCE; THERMAL SUBLIMATION;

FIELD EFFECT TRANSISTORS;

EID: 34547607419     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.182     Document Type: Article

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