Characterization of a magnetron sputtering discharge with simultaneous RF- and DC-excitation of the plasma for the deposition of transparent and conductive ZnO:Al-films

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1251-1256

  Ellmer, K ^a   Cebulla, R ^a   Wendt, R ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Ion energy distributions; Magnetron sputtering; Simultaneous DC and RF excitation; Transparent conductive oxide films; ZnO:Al

Indexed keywords

EID: 0012037322     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00253-3     Document Type: Article

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