Generalized phenomenological model for the effect of electromigration on interfacial reaction

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Hsu, Chia Ming ^a   Wong, David Shan Hill ^a   Chen, Sinn Wen ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; DIFFUSION; ELECTROMIGRATION; MICROELECTRONICS;

ANODE THINNING; CATHODE ENHANCEMENT; PHENOMENOLOGICAL MODEL;

INTERMETALLICS;

EID: 34547575503     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2756999     Document Type: Article

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