Nanopatterning mask fabrication by femtosecond laser irradiation

Journal of Materials Processing Technology

Volumn 192-193, Issue , 2007, Pages 212-217

  Zhou, Y ^a   Hong, M H ^a,b   Fuh, J Y H ^a   Lu, L ^a   Luk'yanchuk, B S ^b   Lim, C S ^a   Wang, Z B ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

Laser; Nanofabrication; Non linear absorption; Optical near field; Surface plasmon

Indexed keywords

CHARGE DENSITY; DIELECTRIC MATERIALS; LASER BEAM EFFECTS; NANOTECHNOLOGY; PERIODIC STRUCTURES; ULTRASHORT PULSES; DIFFRACTION; ELECTRIC EXCITATION; ELECTRIC FIELDS; LASERS; MASKS; SELF ASSEMBLY; SILICA; SURFACE PLASMON RESONANCE; SURFACES;

ELECTRO EXCITATION; LASER WAVELENGTH; MASK FABRICATION; PARTICLE-ASSISTED NANOPATTERNING;

SURFACE PLASMON RESONANCE; PLASMONS;

DIFFRACTION LIMITS; IMPORTANT FEATURES; NONLINEAR ABSORPTIONS; OPTICAL NEAR FIELD; PERIODICAL STRUCTURE; SURFACE PLASMONS; SURFACE PLASMONS RESONANCES; THEORETICAL SIMULATION;

EID: 34547553105     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2007.04.058     Document Type: Article

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