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Volumn 15, Issue 15, 2007, Pages 9444-9449

Simulation-based approach for the accurate fabrication of blazed grating structures by FIB

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRONIC STRUCTURE; FABRICATION; NANOSTRUCTURES; SUBSTRATES;

EID: 34547505419     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.009444     Document Type: Article
Times cited : (20)

References (12)
  • 3
    • 2942744841 scopus 로고    scopus 로고
    • Quasi-dirct. writing of diffractive structures with a focused ion beam
    • Y. Fu, N. K. A. Bryan and W. Zhou, "Quasi-dirct. writing of diffractive structures with a focused ion beam," Opt. Express 12, 1803-1809 (2004).
    • (2004) Opt. Express , vol.12 , pp. 1803-1809
    • Fu, Y.1    Bryan, N.K.A.2    Zhou, W.3
  • 4
    • 4644221123 scopus 로고    scopus 로고
    • Spontaneously generated sinusoidal like structures on Ti-Ni thin, film under focused ion-beam bombardment
    • Y. Fu and N. K. A. Bryan, "Spontaneously generated sinusoidal like structures on Ti-Ni thin, film under focused ion-beam bombardment," Opt. Express 12, 3707-3712 (2004).
    • (2004) Opt. Express , vol.12 , pp. 3707-3712
    • Fu, Y.1    Bryan, N.K.A.2
  • 5
    • 2942702151 scopus 로고    scopus 로고
    • Self-organized formation of a blazed-grating-like structure on Si(100) induced by focused ion-beam scanning
    • Y. Fu, N. K. A. Bryan and W. Zhou, "Self-organized formation of a blazed-grating-like structure on Si(100) induced by focused ion-beam scanning," Opt. Express 12, 227-233 (2004).
    • (2004) Opt. Express , vol.12 , pp. 227-233
    • Fu, Y.1    Bryan, N.K.A.2    Zhou, W.3
  • 6
    • 4944267478 scopus 로고    scopus 로고
    • Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling
    • Y. Fu, N. K. A. Bryan, "Fabrication of three-dimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling," J. Vac. Sci. Technol. B22, 1672-1678 (2004).
    • (2004) J. Vac. Sci. Technol , vol.B22 , pp. 1672-1678
    • Fu, Y.1    Bryan, N.K.A.2
  • 7
    • 33645505116 scopus 로고    scopus 로고
    • Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach
    • D. P. Adams, M. J. Vasile, "Accurate focused ion beam sculpting of silicon using a variable pixel dwell time approach," J. Vac. Sci. Technol. B24, 836-844 (2006).
    • (2006) J. Vac. Sci. Technol , vol.B24 , pp. 836-844
    • Adams, D.P.1    Vasile, M.J.2
  • 8
    • 84946547716 scopus 로고
    • Theory of ripple topography induced by ion bombardment
    • R. M. Bradley and J. M. E. Harper, "Theory of ripple topography induced by ion bombardment," J. Vac. Sci. Technol. A6, 2390-2395 (1988).
    • (1988) J. Vac. Sci. Technol , vol.A6 , pp. 2390-2395
    • Bradley, R.M.1    Harper, J.M.E.2
  • 10
    • 34249649624 scopus 로고    scopus 로고
    • Full three-dimensional simulation of focused ion beam micro/ nanofabrication
    • H. B. Kim, G. Hobler, A. Steiger, A. Lugstein and E. Bertagnolli, "Full three-dimensional simulation of focused ion beam micro/ nanofabrication," Nanotechnology 18, 245303 (2007).
    • (2007) Nanotechnology , vol.18 , pp. 245303
    • Kim, H.B.1    Hobler, G.2    Steiger, A.3    Lugstein, A.4    Bertagnolli, E.5
  • 11
    • 34250216705 scopus 로고    scopus 로고
    • Level, set approach for the simulation of focused ion beam processing on the micro/nano scale
    • H. B. Kim, G. Hobler, A. Steiger, A. Lugstein andE. Bertagnolli, "Level, set approach for the simulation of focused ion beam processing on the micro/nano scale," Nanotechnology 18, 265307 (2007).
    • (2007) Nanotechnology , vol.18 , pp. 265307
    • Kim, H.B.1    Hobler, G.2    Steiger, A.3    Lugstein andE, A.4    Bertagnolli5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.