Role of threading dislocations during treatment of PbTe films in argon plasma

Semiconductor Science and Technology

Volumn 22, Issue 8, 2007, Pages 929-932

  Zimin, S P ^a   Gorlachev, E S ^a   Amirov, I I ^b   Gerke, M N ^c   Zogg, H ^d   Zimin, D ^d,e  

^a YAROSLAVL STATE UNIVERSITY   (Russian Federation)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^c VLADIMIR STATE UNIVERSITY   (Russian Federation)

^d ETH ZURICH   (Switzerland)

^e Balzers AG   (Liechtenstein)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EPITAXIAL GROWTH; FILM GROWTH; LEAD COMPOUNDS; MOLECULAR BEAM EPITAXY; SILICON WAFERS;

AFM MEASUREMENTS; ARGON PLASMA; HILLOCKS; THREADING DISLOCATIONS;

EPITAXIAL FILMS;

EID: 34547411378     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/22/8/018     Document Type: Article

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