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Applied Physics A: Materials Science and Processing

Volumn 88, Issue 4, 2007, Pages 627-632

Fabrication of stabilized piezoelectric thick film for silicon-based MEMS device

(6) Kwon, T Y a,b Kim, Y B a Eom, K a Yoon, D S a,c Lee, H L b Kim, T S a

a Korea Institute of Science and Technology (South Korea)

b Yonsei University (South Korea)

c Yonsei University Wonju (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MEMS; MICROMACHINING; MICROSTRUCTURE; PIEZOELECTRICITY; SCANNING ELECTRON MICROSCOPY; SILICON;

FILM FABRICATION; PIEZOELECTRIC PARTICLES; PIEZOELECTRIC THICK FILMS; SURFACE AREA MEASUREMENTS;

THICK FILMS;

EID: 34547396532 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-007-4025-6 Document Type: Article

Times cited : (11)

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