Properties of in2O3-SnO2 thin films due to the cathode condition in the DC magnetron sputtering process

Journal of the Korean Physical Society

Volumn 50, Issue 6, 2007, Pages 1833-1837

  Ryu, S W ^a   Hong, J S ^a   Kim, S T ^a   Yang, J Y ^a   Ahn, B C ^a   Hong, W P ^a   Park, S H ^a   Kim, H M ^a   Kim, J J ^a  

^a Catholic University of Daegu   (South Korea)

Author keywords

Cathode condition; dc magnetron sputtering; Sheet resistance; Transparent conducting oxide film

Indexed keywords

EID: 34547373084     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.1833     Document Type: Article

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