Highly transparent and conductive ZnO:Al thin films prepared by vacuum arc plasma evaporation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1711-1715

  Miyata, Toshihiro ^a   Minamino, Youhei ^a   Ida, Satoshi ^a   Minami, Tadatsugu ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ACETYLACETONATE; CATHODE PLASMA POWER; GLASS SUBSTRATES; VACUUM ARC PLASMA EVAPORATION (VAPE);

ALUMINUM COMPOUNDS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; EVAPORATION; MAGNETRON SPUTTERING; OPTOELECTRONIC DEVICES; OXIDES; PARTIAL PRESSURE; THICKNESS CONTROL; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS; ZINC COMPOUNDS;

THIN FILMS;

EID: 4344581503     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1759351     Document Type: Conference Paper

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